SPIE Photomask Technology

Monterey Conference Center     |    Monterey, USA    |    29 Sep-01 Oct 2015    

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SPIE Photomask Technology is a 3 day event being held from 29th September to the 1st October 2015 at the Monterey Conference Center in Monterey, United States Of America. This event showcases products like Mask data preparation, Substrates and materials, Patterning tools and processes, 9-inch Glass etc. in the Industrial Products industry.

Exhibitors

HITACHI HIGH TECHNOLOGIES AMERICA, INC.

Schaumburg, USA 


Thermo- Electric Coolers,Si V-grooves / SiOB / Heat sinks / Submounts,RS-Series Inspago Multi Purpose SEM,HPLC Systems Primaide,Ion Milling System,Rack Type HDD Tester/ Eraser

Fortrend Engineering (Hsin Chu) Corp.

Sunnyvale, USA 


Table Top Stand Alone Smif Pod,Thermco Mini Furnace System,Led Wafer Sorter,Horizontal Furnace,Reticle Pod Loader Unloader,Vapor Deposition

SHIN-ETSU MICROSI

Phoenix, USA 


Shin-Etsu Silicone Thermal Greases,Thermal Gel X23-7772-4,Thermal Gel,Thermally Conductive Pads

Micro Lithography, Inc.

Taiwan 


Deep Uv Pellicle Film,I-Line Pellicle Film,Pellicle Mounting Machine,Arf Pellicle Film


Map & Directions

map of Monterey Conference Center

Monterey Conference Center

One Portola Plaza
Monterey, USA

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Portola Hotel & Spa
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Exhibitor Profile

Profile for exhibit includes Electron-Beam Lithography, EUV, Metrology, Lasers, Nanotechnology, Optical/Laser Microlithography, Resist Technology and Processing, Software, Electronic Imaging Components.

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