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Trade Show

SPIE Photomask Technology


SPIE Photomask Technology is a 3 day event being held from 29th September to the 1st October 2015 at the Monterey Conference Center in Monterey, United States Of America. This event showcases products like Mask data preparation, Substrates and materials, Patterning tools and processes, 9-inch Glass etc. in the Industrial Products industry.

Visitors Attending

Jeannie Vadeboncoeur

Jeannie Vadeboncoeur

Account Executive at Advance Reproductions CorporationGreater Boston
36.601403-121.894923

Map & Directions

map of Monterey Conference Center

One Portola Plaza
Monterey, USA

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Exhibitor Profile

Profile for exhibit includes Electron-Beam Lithography, EUV, Metrology, Lasers, Nanotechnology, Optical/Laser Microlithography, Resist Technology and Processing, Software, Electronic Imaging Components.


Exhibitors List

BoothExhibitor NameProducts & Services
-Shin-Etsu MicroSi, Inc.Phoenix, USAThermally Conductive Pads,Thermal Gel X23-7772-4,Shin-Etsu Silicone Thermal Greases,Thermal Gel
-Micro Lithography, Inc.USAPellicle Mounting Machine,Deep Uv Pellicle Film,Arf Pellicle Film,I-Line Pellicle Film
-Nippon Control System CorporationTokyo, JapanNDE Mask Manufacturable Suite (NDE-MS),High-performance,Gesture Recognition Engine
-MSPC KoreaShoreview, USAMSPs Turbo Vaporizers,FlowCytometer,Non-Rotating MOUDI Impactor,Real Time Fiber Monitor,Water Based Condensation Particle Counter
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