SPIE Photomask Technology is a 3 day event being held from 11th September to the 14th September 2017 at the Monterey Conference Center in Monterey, United States Of America. This event showcases products like Mask data preparation, Substrates and materials, Patterning tools and processes, 9-inch Glass etc. in the Industrial Products industry.
Jeannie VadeboncoeurAccount Executive at Advance Reproductions CorporationGreater Boston
Map & Directions
One Portola Plaza
Profile for exhibit includes Electron-Beam Lithography, EUV, Metrology, Lasers, Nanotechnology, Optical/Laser Microlithography, Resist Technology and Processing, Software, Electronic Imaging Components.
|Booth||Exhibitor Name||Products & Services|
|-||Shin-Etsu MicroSi, Inc.Phoenix, USA||Thermally Conductive Pads,Thermal Gel X23-7772-4,Shin-Etsu Silicone Thermal Greases,Thermal Gel|
|-||Micro Lithography, Inc.USA||Pellicle Mounting Machine,Deep Uv Pellicle Film,Arf Pellicle Film,I-Line Pellicle Film|
|-||Nippon Control System CorporationTokyo, Japan||NDE Mask Manufacturable Suite (NDE-MS),High-performance,Gesture Recognition Engine|
|-||MSPC KoreaShoreview, USA||MSPs Turbo Vaporizers,FlowCytometer,Non-Rotating MOUDI Impactor,Real Time Fiber Monitor,Water Based Condensation Particle Counter|
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Photography & Imaging