SPIE Photomask Technology

Monterey Conference Center     |    Monterey, USA    |    29 Sep-01 Oct 2015    


SPIE Photomask Technology is a 3 day event being held from 29th September to the 1st October 2015 at the Monterey Conference Center in Monterey, United States Of America. This event showcases products like Mask data preparation, Substrates and materials, Patterning tools and processes, 9-inch Glass etc. in the Industrial Products industry.

Visitors Attending

Jeannie Vadeboncoeur

Account Executive at Advance Reproductions Corporation

Greater Boston

Jeannie Vadeboncoeur

Map & Directions

map of Monterey Conference Center

Monterey Conference Center

One Portola Plaza
Monterey, USA

Featured Hotels in Monterey

Portola Hotel & Spa
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Exhibitor Profile

Profile for exhibit includes Electron-Beam Lithography, EUV, Metrology, Lasers, Nanotechnology, Optical/Laser Microlithography, Resist Technology and Processing, Software, Electronic Imaging Components.


Shin-Etsu MicroSi, Inc.

Phoenix, USA 

Thermally Conductive Pads,Thermal Gel X23-7772-4,Shin-Etsu Silicone Thermal Greases,Thermal Gel

Micro Lithography, Inc.


Pellicle Mounting Machine,Deep Uv Pellicle Film,Arf Pellicle Film,I-Line Pellicle Film

Nippon Control System Corporation

Tokyo, China 

NDE Mask Manufacturable Suite (NDE-MS),High-performance,Gesture Recognition Engine

MSPC Korea

Shoreview, South Korea 

MSPs Turbo Vaporizers,FlowCytometer,Non-Rotating MOUDI Impactor,Real Time Fiber Monitor,Water Based Condensation Particle Counter

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