10times
22 - 26 Feb 2021Ended

Advances in Patterning Materials and Processes Conference

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Timings

09:00 AM - 06:00 PM
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Estimated Turnout

upto 100
Delegates
Based on previous editions

Editions

Feb 2021

Frequency

Not Available
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We discuss here our revolutionary technique to both apply photo resist and develop latent images in photo resist using dry technologies instead of .. Read more the existing wet spin coating and development that have been the standard over the last several decades. We will review the key advantages of dry resist processing over wet resist processing: stability, photo sensitivity, environmental footprint, and cost. This nascent technology has demonstrated best in class resist performance at leading edge design rules, breaks several long standing tradeoffs in EUV photoresist materials, and opens the door to a new world of innovations in EUV lithography patterning.

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