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"Photomask & Next Generation Lithography Mask Technology."
Photomask Japan is an international symposium that brings together engineers and investigators from around the world to discuss progress and trends in photomasks and NGL masks. The program includes invited and contributed papers, poster sessions, and panel discussions, with opportunities for students to meet with speakers and exhibitors.
Timings09:00 AM-06:00 PM (expected)Not Verified | Entry FeesCheck Official Website |
Estimated Turnout1000 - 5000Visitors 100 - 500 Exhibitors Based on previous editions | Category & TypeTrade ShowIndustrial Engineering |
EditionsApr 2024 Follow+14 more editions Frequency Annual | Official LinksWebsiteContactsReport Error Claim this event |
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23 Apr 2020
Exhibitors Profile
Photomasks, Equipments for Photomasks, process and equipments for developing, etching, cleaning etc., Photomask Writing Tools and Technologies, Metrology Tools and Technologies, Inspection Tools and Technologies, Repairing Tools and Technologies, Mask Data Preparations, EDA and DFM for Photomasks, Photomasks with RET: PSM, Masks with OPC, Photomask-relating Lithography Technologies, NGL Masks and Applications, EUV, Nano-imprint etc.
Venue Map & Directions

1 Chome-1-1 Minatomirai Nishi-ku Yokohama-shi Kanagawa-ken 220-0012
Japan
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