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"The Industrial Products, Spares, Goods & Supplies Industry trade fair."
SPIE Photomask Technology and EUVL, a technical meeting for mask makers, EUV lithography, emerging technologies, and the future of mask business. Mark your calendar for 2021 This key technical meeting is for mask makers, EUVL, emerging technologies, and the future of mask business. SPIE Photomask Technology and the International Conference on Extreme Ultraviolet Lithography are co-located conferences. Present your research at the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.
Timings09:00 AM-06:00 PM (expected)
Entry FeesCheck Official Website
Estimated Turnout5000 - 20,000
100 - 500 Exhibitors Based on previous editions
Category & TypeTrade Show
Education & Training
+12 more editions
Next edition likely in Sep 2022
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Profile for exhibit includes Electron-Beam Lithography, EUV, Metrology, Lasers, Nanotechnology, Optical/Laser Microlithography, Resist Technology and Processing, Software, Electronic Imaging Components.