Trade Show

SPIE Photomask Technology

26 - 30 Sep 2021 New Date Reminder
Monterey Conference Center, Monterey, USA
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"The Industrial Products, Spares, Goods & Supplies Industry trade fair."
SPIE Photomask Technology and EUVL, a technical meeting for mask makers, EUV lithography, emerging technologies, and the future of mask business. Mark your calendar for 2021 This key technical meeting is for mask makers, EUVL, emerging technologies, and the future of mask business. SPIE Photomask Technology and the International Conference on Extreme Ultraviolet Lithography are co-located conferences. Present your research at the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.


09:00 AM-06:00 PM (expected)
Not Verified

Entry Fees

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Estimated Turnout

5000 - 20,000

100 - 500 Exhibitors Based on previous editions

Category & Type

Trade Show
Education & Training


Sep 2021
+12 more editions

Frequency Annual
Next edition likely in Sep 2022

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Spie- International Society For Optical EngineeringRenowned

USA221 Total Events / 20 Upcoming Events

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Exhibitors List

Exhibitors Profile

Profile for exhibit includes Electron-Beam Lithography, EUV, Metrology, Lasers, Nanotechnology, Optical/Laser Microlithography, Resist Technology and Processing, Software, Electronic Imaging Components.


Venue Map & Directions

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1 Portola Plaza, Monterey, CA 93940

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